DOI: 10.1016/j.tsf.2017.03.047
Paper Summary:
Title: Angular dependences of SiO 2 etch rates at different bias voltages in CF 4 , C 2 F 6 , and C 4 F 8 plasmas
Author(s): Kim, Jun-Hyun; Cho, Sung-Woon; Park, Chang Jin; Chae, Heeyeop; Kim, Chang-Koo
Year: 2017
DOI: 10.1016/j.tsf.2017.03.047
URL: https://doi.org/10.1016/j.tsf.2017.03.047
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Received on: 2023-11-16
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