DOI: 10.1016/j.tsf.2017.03.047

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DOI: 10.1016/j.tsf.2017.03.047

Paper Summary:

Title: Angular dependences of SiO 2 etch rates at different bias voltages in CF 4 , C 2 F 6 , and C 4 F 8 plasmas

Author(s): Kim, Jun-Hyun; Cho, Sung-Woon; Park, Chang Jin; Chae, Heeyeop; Kim, Chang-Koo

Year: 2017

DOI: 10.1016/j.tsf.2017.03.047

URL: https://doi.org/10.1016/j.tsf.2017.03.047

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Received on: 2023-11-16

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2023-11-18, ∼1605👍, 0💬

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