Database DOI General ISSN ORCID Paper

DOI: 10.1117/12.3011818

Paper Summary:

Title: [Novel Patterning Technologies 2024(San Jose, United States 2024.2.25-2024.3.1)] Novel Patterning Technologies 2024 || Advanced EUV patterning of 2D TMDs for CMOS integration

Author(s): Faramarzi, Vina (author);de Poortere, Etienne (author);Parayil Venugopalan, Syam (author);Woltgens, Pieter (author);Woo, Youngtag (author);van de Kerkhof, Mark (author);Kumar, Pawan (author);Medina Silva, Henry (author);Morin, Pierre (author);Asselberghs, Inge (author);Dorow, Chelsey (author);O'Brien, Kevin (author);Maxey, Kirby (author);Avci, Uygar (author);Liddle, J. Alexander (editor);Ruiz, Ricardo (editor)

Year: 2024

DOI: 10.1117/12.3011818

URL: https://doi.org/10.1117/12.3011818

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2024-07-25, ∼631👍, 0💬

Database DOI General ISSN ORCID Paper