DOI: 10.1002/CEAT.201700126

Paper Summary:

Title: Angular Dependence of Si 3 N 4 Etching in C 4 F 6 /CH 2 F 2 /O 2 /Ar Plasmas

Author(s): Kim, Jun-Hyun; Cho, Sung-Woon; Kim, Chang-Koo

Year: 2017

DOI: 10.1002/CEAT.201700126

URL: https://doi.org/10.1002/CEAT.201700126

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Received on: 2023-11-16

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