DOI: 10.1002/CEAT.201700126

Paper Summary:

Title: Angular Dependence of Si ₃ N ₄ Etching in C ₄ F ₆ /CH ₂ F ₂ /O ₂ /Ar Plasmas

Author(s): Kim, Jun-Hyun; Cho, Sung-Woon; Kim, Chang-Koo

Year: 2017

DOI: 10.1002/CEAT.201700126

URL: https://doi.org/10.1002/CEAT.201700126

Received on: 2023-11-16

✍: FYIcenter.com

2023-11-18, 136👍, 0💬

Popular Posts:

doi.FYIcenter.com is a FYI center on DOI (Digital Object Identifier). Questions and comments are wel...

How to download DOI metadata from Sci-Hub? Sci-Hub also provides DOI metadata in MySQL dump format. ...

Where to find tutorials on DOI (Digital Object Identifier)? Here is a large collection of tutorials ...

How to lookup OA information of a given DOI number? If you know the DOI (Digital Object Identifier) ...

How to use the PDF File Download service at ftp.ncbi.nlm.nih.gov/pub /pmc?The PDF File Download serv...